43 lines
2.4 KiB
Plaintext
43 lines
2.4 KiB
Plaintext
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Layer / Design rule,CD,,space,,Comment
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MOSFET width,0.135,,,,FOMSE
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MOSFET width in standard cells,0.075,,,,FOMSESC
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Spacing of poly on field to diff,,,0.065,,PFDSE
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Spacing of poly on field to tap,,,0.005,,PFTSE
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Enclosure of tap by nwell for pwell res,,,0.22,,PTAP_NWL_SP
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Grid conversion rounding factor,,,0.005,,GRCF
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Licon enclosure rounding,,,0.02,,LICENCLR
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LI1CD add/drop,0.01,,0.04,,
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Huge metal X min. W and L,3,,,,HugeM
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Min Nsdm area ,0.265,,,,MinNsdmArea
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Min Psdm area,0.255,,,,MinPsdmArea
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Min N/Psdm hole area ,0.265,,,,MinNPsdmHole
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Large waffle size must be divisible by 4,7.2,,,,waffle_large
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P1M additional CD control,0.011,,,,P1MCDcontrol
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Li1 proximity correction,,,0.25,,LI1PROXSpace
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"Serif added to nwell convex corner (SXX-572, 573)",0.22,,,,NwellCvxSerif
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"Serif added to nwell concave corner (SXX-572, 573)",0.12,,,,NwellCveSerif
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NWM extension beyond nwell edge straddling de_nFet_source (for GSMC; QZM-133),0.075,,,,NvhvNwellExt
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Min enclosure of pad by pmm for Cu inductor (JNET-80) ,0,,,,padPMMEncInd
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Min enclosure of pmm by cu1m for Cu inductor (JNET-80) ,10.75,,,,pmmCu1mEncInd
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Min enclosure of pbo by cu1m per DECA 000348 Rev S,10,,,,pboCu1mEnc
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Min enclosure of pmm by pmm2 for radio flow in the die (JNET-80) ,13,,,,pmmPmm2EncInd
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Min enclosure of pmm by pmm2 inside frame,7.5,,,,pmmPmm2EncIndFrame
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Min space between pmm2 and Inductor.dg ,,,7.5,,pmm2IndSpc
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Min cu1m PD across full chip,0.35,,,,MinCU1Mpd
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Max cu1m PD across full chip,0.45,,,,MaxCU1Mpd
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Spacing between RDL and outer edge of seal ring,15,,,,RdlSealSpc
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Spacing between RDL and pmm2,6.16,,,,RdlPmm2Spc
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Enclosure of etest module in die by cpmm2,0,,,,EtestCpmm2Enc
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"Keepout of active, poly, li and metal to NSM (TCS-2253)",,,1,,NSMKeepout
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"3 um keepout of active, poly, li and metal to areaid.dt/areaid.ft (TCS-2253)",,,3,,NSMKeepout_3um
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pnp_emitter sizing (S8P GSMC flow),,,0.05,,PnpEmitterSzGSMC
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pnp_emitter sizing (other flows),,,0.03,,PnpEmitterSz
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MiM Capacitor aspect ration,20,,,,MiM_AR
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Min NCM space to be used to preserve NCM CL algorithm (avoid LVL error),,,1.27,,NCM_0LVL
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Min space of NCM between core and periphery due to existing layout restriction,,,0.96,,NcmCorePeriSP
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Multiplication factor,,,0.01,,S8LVconv
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Minimum scribe width,50,,,,scribew
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spacing of p-well outside deep n-well to deep n-well mask edge,,,0.12,,NWDNWENCL
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p-well in deep n-well to p-sub,,,1.2,,NWDNWOL
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Field oxide etchback after P1ME before implants,,,0.04,,WFDEL
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