2.0 KiB
2.0 KiB
1 | Name | Description | Flags | Value | Unit |
---|---|---|---|---|---|
2 | (m2.-) | | Algorithm should flag errors, for met2, if ANY of the following is true: | An entire 700x700 window is covered by cmm2 waffleDrop, and metX PD < 70% for same window. | 80-100% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 65% for same window. | 60-80% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 60% for same window. | 50-60% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 50% for same window. | 40-50% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 40% for same window. | 30-40% of 700x700 window is covered by cmm2 waffleDrop, and metX PD < 30% for same window. | Exclude cells whose area is below 40Kum2. Required for IP, Recommended for Chip-level. | RC | ||
3 | (m2.1) | Width of metal 2 | 0.140 | µm | |
4 | (m2.2) | Spacing of metal 2 to metal 2 | 0.140 | µm | |
5 | (m2.3a) | Min. spacing of features attached to or extending from huge_met2 for a distance of up to 0.280 µm to metal2 (rule not checked over non-huge met2 features) | 0.280 | µm | |
6 | (m2.3b) | Min. spacing of huge_met2 to metal2 excluding features checked by m2.3a | 0.280 | µm | |
7 | (m2.3c) | Min spacing between floating_met2 with AR_met2_A >= 0.05 and AR_met2_B =< 0.032, outside areaid:sc must be greater than | RR | 0.145 | µm |
8 | (m2.4) | Via must be enclosed by Met2 by at least … | P AL | 0.055 | µm |
9 | (m2.5) | Via must be enclosed by Met2 on one of two adjacent sides by at least … | AL | 0.085 | µm |
10 | (m2.6) | Min metal2 area | 0.0676 | µm² | |
11 | (m2.7) | Min area of metal2 holes | 0.140 | µm² | |
12 | (m2.pd.1) | Min MM2_oxide_Pattern_density | RR | 0.7 | \- |
13 | (m2.pd.2a) | Rule m2.pd.1 has to be checked by dividing the chip into square regions of width and length equal to … | A | 700 | µm |
14 | (m2.pd.2b) | Rule m2.pd.1 has to be checked by dividing the chip into steps of … | A | 70 | |
15 | (m2.11) | Max width of metal2 | CU | 4.000 | µm |
16 | (m2.12) | Add slots and remove vias and contacts if met2 wider than….. | CU | 3.200 | |
17 | (m2.13) | Max pattern density (PD) of metal2 | CU | 0.77 | \- |
18 | (m2.14) | Met2 PD window size | CU | 50.000 | µm |
19 | (m2.14a) | Met2 PD window step | CU | 25.000 | µm |
20 | (m2.15) | Via must be enclosed by met2 by at least… | CU | 0.040 | µm |