Layer / Design rule,CD,,space,,Comment
Min HVNwell to any nwell space,,,2,,HVNwell_Nwell_SP
Min HVDiff width,0.29,,,,HVDiff_CD
Min HVDiff space,,,0.3,,HVDiff_SP
Min HV Pmos gate width,0.5,,,,HVP_gate_CD
Min space between HV poly,,,0.28,,HVPoly_SP
Min HV Nmos gate width,0.37,,,,HVPoly_CD
HV P+ Diff enclosure by Nwell,0.33,,,,HVPdiff_nwell_enc
HV N+ diff space to Nwell,,,0.43,,HVNdiff_nwell_SP
HV N+ tap enclosure by Nwell,0.33,,,,HVNtap_nwell_enc
HV P+tap space to Nwell,,,0.43,,HVPtap_nwell_SP
Photoresist tilted implant penetration,0.02,,,,HVPrPenetration
Photoresist tilted implant blocking distance,0.013,,,,HVPrBlocking
Min size of HVTip,0.1,,,,HVTipMinSize
Extra CD tol for HVNTM to match Ram7 process,0.015,,,,HVNTMExtraCdTol
Min HVDiff resistor width,0.29,,,,HVDiff_Res_CD
High voltage n+-n+ or p+-p+,,,0.3,,HVDPTS15
HV MOSFET channel length,0.5,,,,HVPCD